APPARATUS AND METHOD FOR PLASMA ION IMPLANTATION OF NOBLE METALS AND METHOD OF ATTAINING NANO-SIZED NOBLE METAL COMPOSITES BY USING THE SAME

摘要

PURPOSE: A plasma ion implantation device of noble metals and a method thereof, and a method for forming nano-sized noble metal composites by using the same are provided to form a noble metal cluster, thereby forming nano-sized noble metal composites on the surface of a dielectric object. CONSTITUTION: A vacuum chamber(110) keeps inside with the vacuum condition. A magnetron deposition source(120) is arranged in the vacuum chamber for thin film deposition. A sample mounting stand(130) faces the magnetron deposition source in the vacuum chamber. A pulse DC power supply device(140) applies pulse DC power to the magnetron deposition source. A high voltage pulse power supply device(150) applies a high voltage pulse, which is synchronized with the pulse DC power, to the sample mounting stand.