首页> 外国专利> MULTI-LAYERED STRUCTURE MANUFACTURING PROCESS WITH TRIMMING USING THERMAL-MECHANICAL EFFECTS FOR MANUFACTURING A MULTI-LAYERED STRUCTURE

MULTI-LAYERED STRUCTURE MANUFACTURING PROCESS WITH TRIMMING USING THERMAL-MECHANICAL EFFECTS FOR MANUFACTURING A MULTI-LAYERED STRUCTURE

机译:利用热机械效应修整的多层结构制造过程,用于制造多层结构

摘要

PURPOSE: A multi-layered structure manufacturing process with trimming using thermal-mechanical effects is provided to solve a problem of peel-off.;CONSTITUTION: The edge of a first wafer(110) is trimmed using a grinding wheel(150) before a step which is making a thin first wafer. A work surface(151) of the grinding wheel includes grit particles with an average size of 18 micron or less or 800 mesh or greater. A trimming step is performed by lowering the descent speed of the grinding wheel as 5 micron per second or greater. The grinding wheel lowering within the first wafer is stopped at a height(h110) of 39 micro meters or grater from a bonding interface.;COPYRIGHT KIPO 2012
机译:目的:提供一种利用热机械效应进行修整的多层结构制造工艺,以解决剥离的问题。组成:在进行抛光之前,使用砂轮(150)修整第一晶圆(110)的边缘。步骤是制造薄的第一晶片。砂轮的工作表面(151)包括平均尺寸为18微米或更小或800目或更大的砂粒。通过将砂轮的下降速度降低到每秒5微米或更高来执行修整步骤。下降到第一个晶片内的砂轮停在39微米的高度(h110)或从键合界面磨碎的地方。; COPYRIGHT KIPO 2012

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