APPARATUS FOR PROXIMITY EXPOSURE, METHOD FOR CONTROLLING TEMPERATURE OF STAGE IN APPARATUS FOR PROXIMITY EXPOSURE, AND METHOD FOR MANUFACTURING DISPLAY PANEL PLATE

摘要

The present invention provides a proximity exposure device, a carrying stage temperature control method and a manufacturing method for a panel substrate. According to the proximity exposure device, when the carrying stage for moving the substrate is driven through a linear motor, the temperature change of the carrying stage is reduced thereby baking the pattern with a high precision. The temperature of the carrying stage is detected. When operation of the carrying stage is started or the carrying stage is in operation, at a state that a curtain layer (2) is kept at a curtain layer rack (20) and a substrate (1) is not carried on a chuck plate (10), the carrying stage is driven through the linear motor when the detected temperature of the carrying stage is lower than a lower limit value, soas to perform a first device warming motion of increasing the temperature of the carrying stage to a temperature which is above a reference value that is higher than the lower limit value through theheat of the linear motor. Even when the temperature of the carrying platform before operation or in operation reduces to a temperature which is lower than the lower limit value, the temperature of the carrying platform in exposure treatment is lower thereby baking the pattern with an excellent precision.