METHOD OF MANUFACTURING SUBSTRATE FOR RECYCLED PHOTOMASK, METHOD OF MANUFACTURING BLANK FOR RECYCLED PHOTOMASK, RECYCLED PHOTOMASK, METHOD OF MANUFACTURING RECYCLED PHOTOMASK, AND PATTERN TRANSFER METHOD

摘要

The invention relates to a substrate manufacturing method, a blank manufacturing method, a regenerating photomask and a manufacturing method thereof. A used photomask having a film pattern and formed on a first main surface of a transparent substrate is applied. The method comprises a first step in which the film pattern is removed from the first main surface, and a second step in which the firstmain surface and a second main surface are respectively ground. In the grinding process, the grinding operations with the following grinding quantities are performed. The grinding quantities make thearea beyond the transfer printing areas of the first main surface and the second main surface have no damaged defects with a size larger than 300 (mu)m remained and have damaged defects with a size larger than 2 (mu)m but smaller than 300 (mu)m remained. The grinding quantities further make the transfer printing area of the second main surface have no damaged defects with a size larger than 100 (mu)m remained.