RESONANT STRUCTURE WITH SPATIALLY DISTINCT PLASMA SECONDARIES USING A SINGLE GENERATOR AND SWITCHING ELEMENTS

摘要

A plasma reactor for processing a workpiece: packaging material; A workpiece support pedestal within the packaging material facing the overlap (overlying) portion of said exterior packaging material, between said workpiece support pedestal and the overlap portion of the packaging material, this process area extending across the diameter of the workpiece support pedestal is formed, the packaging material the first and second through-opening and a pair of two openings of the first and second pair of openings, the workpiece support pedestal adjacent to both sides of the workpiece support pedestal; A first hollow duct, located outside the process area connected to said first pair of openings for providing a first toroidal path extending through said conduit and across said process region, the first hollow conduit; A second hollow duct, located outside the process area and the second pair is connected to the opening through the conduit and the second hollow conduit, providing a second toroidal path that extends across the process region; As the first and second plasma source applicator associated induced within the first and second hollow conduits, said first and second plasma source applicator each of a plasma in a respective one of the first and second toroidal path first and second plasma source and applicator, which can be maintained; RF generator that provides RF output current; And the RF generator and the first and second plasma source power applicator is connected between the current applied to the respective periodic time segments of RF output current to respective one of said first and second plasma source power applicator switching network It includes.