rapid thermal processing apparatus that can extend the life of the pyrometer

摘要

in the rapid thermal processing apparatus according to the present invention, the pyrometer 140 wafers, 120 receiving rod for receiving light emitted from the copy (141); Light which is installed so as to irradiate the light to the wafer 120 through the light receiving load 141, the source (143); Photo-sensing unit and irradiated on the wafer 120 from the light source 143, the light emitted from the light reflected and copy the wafer 120, which is reflected through the light receiving load receiving section 141 for measuring the temperature of the wafer 120 ( 144); wherein the light receiving rod 141 formed on the wafer (received by the heat by-product of 120) rod 141 is not contaminated is characterized in that the transparent protective cap 170 is installed. According to the present invention, and do not have the inconvenience of replacing the light receiving contaminated rod 141 is prevented because the load of the light receiving section 141 by the transparent protection cap 170, just at the right time replacing only the transparent protective cap (170) If you will be as well, eliminating the need for initialization settings of the pyrometer (140) Fair pause time is improved process efficiency decreases. And no need to replace the expensive light receiving load 141 is less equipment maintenance costs.