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Di copper as a precursor for the deposition of metallic copper (I) oxalate complexes
Di copper as a precursor for the deposition of metallic copper (I) oxalate complexes
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机译:二铜作为金属草酸铜(I)配合物沉积的前体
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摘要
The invention alkene or alkyne such as de- stabilized by a neutral Lewis base copper (I) oxalate complexes , and as a precursor for the deposition of metallic copper di- copper (I) relates to the use of the oxalate complexes , at this time, the neutral Lewis base used is an alkyne , alkene , triaryl phosphine , an isonitrile or CO .
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