Uniform Etching Apparatus for Large Optical Systems Including Lightweight Processed Parts and Uniform Etching Method for Large Optical Systems

摘要

PURPOSE: The uniform etching device and uniform etching method of a large optical system including a lightweight processing part are provided to uniformly etch the large optical system by generating turbulence to an etching solution based on a rotating rod combined with a turbulence generating unit. CONSTITUTION: The uniform etching device of a large optical system(10) includes a plurality of lightweight processing parts(100) equipped with opening parts and an internal spaces. The uniform etching device includes an etching solution inlet and an etching solution outlet. An etching solution is stored in an etching tank(210). The large optical system is emerged in the etching tank. A rotating rod(400), which is rotatable based on the longitudinal direction, is inserted into the lightweight processing part. A turbulence generating unit(410) is formed at the rotating rod and generates turbulence to the etching solution.