首页> 外国专利> Thin film and wafer-bonded encapsulated in micro-electro-mechanical systems for the adhesive-prevention technology

Thin film and wafer-bonded encapsulated in micro-electro-mechanical systems for the adhesive-prevention technology

机译:薄膜和晶圆键合封装在微机电系统中,用于防粘技术

摘要

Present invention is disclosed and has a number of the city. In one aspect, the invention relates to a thin film or wafer encapsulated MEMS, and manufacturing techniques of the present invention prevents the adhesive wafer or a thin film encapsulated MEMS or employing the manufacturing technology. In one embodiment, after the encapsulation of the MEMS, adhesion-preventing channel is formed by providing a "access" to the chamber into which a part or all of the active members of the machine structure or the electrode of the MEMS. Then, the adhesion-preventing channel through the adhesive-preventing fluid is introduced into (e.g., a gas or a gas vapor) the chamber. Adhesion-preventing liquid is one of the active member or the electrode of the machine structure, whereby some or all of the deposition, the pressure-sensitive adhesive on such member or the electrode layer (for example, a single layer coating or a self-set monolayer) and / or gas It provides a release molecules. Since the introduction of anti-fluid and / or applied, the adhesive-adhesive protection channel may be sealing, capping, plugging and / or closed to define and control the mechanical damping in the chamber environment. In this regard, it forms the environment for storing and / or receiving a sealing, capping and / or closure of the machine structure of the chamber into the chamber. The environment should not only predetermined, desired and / or selected mechanical damping of the mechanical structure provides a proper sealing. (For example, a gas or a gas vapor) final encapsulated fluid machine structure operation (e.g., pressure) variable in may be controlled, selected and / or designed to provide a desired and / or predetermined operating environment is. ; Encapsulation layer, sealing the chamber, the pressure-sensitive adhesive-protection channel, adhesion-preventing liquid, anisotropic etching, adhesion-prevention plugs, the trench, an insulating layer, a diffusion barrier, the anodic bonding, the cap wafer, the trap
机译:公开了本发明并且具有多个城市。在一个方面,本发明涉及一种薄膜或晶片封装的MEMS,并且本发明的制造技术防止粘合晶片或薄膜封装的MEMS或采用该制造技术。在一个实施例中,在MEMS的封装之后,通过提供对腔室的“进入”来形成防止粘附的通道,机器结构的部分或全部有源构件或MEMS的电极进入该腔室。然后,通过防粘流体的防粘通道被引入到腔室内(例如,气体或蒸气)。防粘液体是机械结构的主动构件或电极中的一种,从而在该构件或电极层上沉积一些或全部沉积,压敏粘合剂(例如,单层涂层或自粘集单层)和/或气体它提供释放分子。由于引入了抗流体和/或施加了防粘剂,因此粘合剂-粘合剂保护通道可以是密封的,封盖的,堵塞的和/或封闭的,以限定和控制腔室环境中的机械阻尼。就此而言,它形成了用于存储和/或容纳腔室的机器结构到腔室中的密封,加盖和/或封闭的环境。环境不仅应为机械结构的预定,期望和/或选定的机械阻尼提供适当的密封。可以控制,选择和/或设计(例如,气体或气体蒸汽)最终封装的流体机械结构的操作(例如,压力)以提供期望的和/或预定的操作环境。 ;密封层,密封室,压敏胶保护通道,防粘液,各向异性蚀刻,防粘塞,沟槽,绝缘层,扩散阻挡层,阳极键合,盖晶片,阱

著录项

  • 公开/公告号KR101055029B1

    专利类型

  • 公开/公告日2011-08-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20067000711

  • 发明设计人 패트리지 아론;룻츠 마르쿠스;

    申请日2004-06-15

  • 分类号H01L21/00;

  • 国家 KR

  • 入库时间 2022-08-21 17:49:59

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