首页> 外国专利> Apparatus for determining a target position of a charged particle beam, a process for the use of the device and in front of the direction of treating the apparatus for determining a target position is used

Apparatus for determining a target position of a charged particle beam, a process for the use of the device and in front of the direction of treating the apparatus for determining a target position is used

机译:用于确定带电粒子束的目标位置的设备,使用该设备的过程以及在用于确定目标位置的设备的处理方向之前使用的设备

摘要

Apparatus for determining a target position of a charged particle beam, comprising:a setting unit (14), one of the irradiation position of a charged particle beam irradiation position be determined from a source (11) of the charged particle beam is radiated, in a depth direction of an object is established,a reflection means (18), the the the charged particle beam is transmitted, or it can pass through, and a first light emitted from a region of the object, the with the the charged particle beam is irradiated, is emitted, and a second emitted light, which, due to an irradiation with an excitation light from a region, including the region of the object, the with the the charged particle beam is irradiated, which is emitted from the axis of the charged particle beam path reflected, andan imaging unit (24) at a position where the first emitted light and the second emitted light, which are reflected from the reflection means, is arranged and the region, including the region of the object, the with the..
机译:用于确定带电粒子束的目标位置的设备,包括:设置单元(14),从带电粒子束的源(11)辐射确定带电粒子束的照射位置之一,确定物体的深度方向,然后通过反射装置(18),使带电粒子束通过,或者其可以通过,并且从物体的区域发射的第一光与带电粒子束一起发射。照射第二束光,并发射第二束光,该第二束光由于被来自对象区域的区域的激发光照射而被带电粒子束照射,第二束光从被测物的轴发射。被反射的带电粒子束路径,以及配置在从反射单元反射的第一出射光和第二出射光的位置以及包括被摄体的区域在内的区域的摄像单元(24),与..

著录项

  • 公开/公告号DE112007000128B4

    专利类型

  • 公开/公告日2011-05-19

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20071100128T

  • 发明设计人

    申请日2007-01-12

  • 分类号A61B3/12;A61B3/14;A61N5/10;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:59

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