首页> 外国专利> Method for manufacturing collimator that is utilized as analysis grid at x-ray detector for reducing e.g. scattered beam in computer tomography scanner for examining patient, involves filling intermediate spaces with gold or tungsten

Method for manufacturing collimator that is utilized as analysis grid at x-ray detector for reducing e.g. scattered beam in computer tomography scanner for examining patient, involves filling intermediate spaces with gold or tungsten

机译:准直器的制造方法,该准直器在X射线检测器处用作分析栅格,以减少例如计算机断层扫描仪中用于检查患者的散射光束,涉及用金或钨填充中间空间

摘要

The method involves producing a grid structure made of silicon bars (5) in a n-doped silicon substrate (1) in a periodic arrangement under application of technology for manufacturing porous silicon, where intermediate spaces (3) lie between the silicon bars. The intermediate spaces are partially filled with gold or gold alloy or with a tungsten or a tungsten alloy to form the bars that absorb x-rays. Middle distance of bars is adjusted to a value that lies between one and five micrometer, where the bars exhibit aspect ratio that lies between 1:50 and 1:250. An independent claim is also included for a computer tomography scanner that comprises an x-ray detector.
机译:该方法涉及在用于制造多孔硅的技术的应用下以周期性布置在n型掺杂的硅衬底(1)中制造由硅条(5)制成的网格结构,其中在硅条之间存在中间空间(3)。中间空间部分填充有金或金合金或钨或钨合金,以形成吸收X射线的条。条的中间距离被调整为介于1到5微米之间的值,其中条的纵横比介于1:50和1:250之间。对于包括X射线检测器的计算机断层扫描仪,还包括独立权利要求。

著录项

  • 公开/公告号DE102009032983A1

    专利类型

  • 公开/公告日2011-01-20

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号DE20091032983

  • 发明设计人 HEMPEL ECKHARD;

    申请日2009-07-14

  • 分类号G21K1/02;A61B6/03;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:47

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