首页> 外国专利> Method for processing disk-shaped semiconductor wafer, involves forming circular opening on rear side of wafer, surrounding circular opening by ring shaped reinforcement sections with two beveled surface area

Method for processing disk-shaped semiconductor wafer, involves forming circular opening on rear side of wafer, surrounding circular opening by ring shaped reinforcement sections with two beveled surface area

机译:用于处理盘状半导体晶片的方法,包括在晶片的背面上形成圆形开口,并通过具有两个斜面表面积的环形加强部围绕圆形开口。

摘要

The method involves driving a rotary shaft perpendicular to a grinding surface, and lowering a grinding wheel to connect the grinding surface with a rear side (11b) of a wafer (11) that is held on a clamping table. The clamping table is rotated, and the grinding wheel is loaded. The rear side of the wafer is grinded in an area to same depth as a lower end of a ring shaped groove for forming conical ring shaped reinforcement sections, so that a circular opening is formed on the rear side of the wafer and surrounded by the ring shaped reinforcement sections with two beveled surface area.
机译:该方法包括驱动垂直于研磨表面的旋转轴,以及降低研磨轮以将研磨表面与保持在夹持台上的晶片(11)的后侧(11b)连接。旋转夹紧台,并装入砂轮。晶片的后侧在与用于形成圆锥形环形加强部分的环形凹槽的下端相同深度的区域内被研磨,从而在晶片的后侧上形成圆形开口并被环包围带有两个斜面表面积的异型增强段。

著录项

  • 公开/公告号DE102010051214A1

    专利类型

  • 公开/公告日2011-05-19

    原文格式PDF

  • 申请/专利权人 DISCO CORPORATION;

    申请/专利号DE20101051214

  • 发明设计人 TABUCHI TOMOTAKA;

    申请日2010-11-12

  • 分类号H01L21/304;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:09

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