a method to determine the critical size of an inclusion in a sputtertarget aluminium or aluminium alloy

摘要

The present invention relates to a method for determining a critical size for a diameter of an AlSUB2/SUBOSUB3 /SUBinclusion ( 38 ) in an Al or Al alloy sputter target ( 42 ) to prevent arcing during sputtering thereof. This method includes providing a sputtering apparatus having an argon plasma. The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment of an Al or Al alloy sputter target having an AlSUB2/SUBOSUB3 /SUBinclusion-free sputtering surface. When the thickness of the sheath is known for a selected sputtering environment, the critical size of an AlSUB2/SUBOSUB3 /SUBinclusion ( 38 ) can be determined based upon the thickness of the sheath. More specifically, the diameter of an AlSUB2/SUBOSUB3 /SUBinclusion ( 38 ) in an Al or Al alloy sputter target ( 42 ) must be less than the thickness of the plasma sheath during sputtering under the selected sputtering environment to inhibit arcing.