首页> 外国专利> Manufacturing silica crucible by fusion of quartz powder in porous mold connected to aspiration system, comprises perfoming primary fusion of quartz powder into dense silica layer, and performing secondary fusion of quartz powder

Manufacturing silica crucible by fusion of quartz powder in porous mold connected to aspiration system, comprises perfoming primary fusion of quartz powder into dense silica layer, and performing secondary fusion of quartz powder

机译:通过在与抽吸系统相连的多孔模具中熔融石英粉来制造石英坩埚,包括将石英粉的一次熔融浸入致密的二氧化硅层中,以及进行石英粉的二次熔融。

摘要

The process of manufacturing a silica crucible by fusion of quartz powder (2) in a porous mold (1) connected to an aspiration system, comprises perfoming primary fusion of the quartz powder into a dense silica layer by forming a dense silica skin on inner side of the crucible, and performing secondary fusion of the quartz powder into porous silica layer outside the crucible under second plasma intensity and second aspiration intensity. The mold is rotated around a vertical axis. An air plasma heating the gas is created inside the mold by the electrodes forming an electric arc. The process of manufacturing a silica crucible by fusion of quartz powder (2) in a porous mold (1) connected to an aspiration system, comprises perfoming primary fusion of the quartz powder into a dense silica layer by forming a dense silica skin on inner side of the crucible, and performing secondary fusion of the quartz powder into porous silica layer outside the crucible under second plasma intensity and second aspiration intensity. The mold is rotated around a vertical axis. An air plasma heating the gas is created inside the mold by the electrodes forming an electric arc. The dense silica skin is obtained under first plasma intensity and first aspiration intensity in the mold. The first plasma intensity is greater than the second plasma intensity, and the first aspiration intensity is greater than the second aspiration intensity. A cover with an opening is placed above the mold. The electrodes cross the opening during the formation of the dense silica skin. A gas stream is forced to pass through the opening towards inner side of the crucible. An area of the cover or a distance between the cover and the crucible is larger during the formation of the porous silica layer and dense silica skin. The cover is opened or elongated from the crucible during first aspiration intensity after the formation of dense silica skin and before the second aspiration intensity. The gas (70 vol.%) is introduced inside the crucible using an injector during the formation of dense silica skin. During the formation of the dense silica skin, an area of the cover opening represents 20-70% of the area of the final crucible. The plasma arc is initiated in the air by the electrodes placed over the cover, where the electrodes are then lowered through the opening of the cover to form dense silica skin. The first plasma intensity is changed to the second plasma intensity after the pressure in the aspiration system passes 100 mbars. The second aspiration intensity is zero. An independent claim is included for a device for manufacturing silica crucible.
机译:通过在连接到抽吸系统的多孔模具(1)中熔融石英粉(2)来制造二氧化硅坩埚的方法,该方法包括通过在内侧形成致密的二氧化硅表皮,将石英粉初步熔融成致密的二氧化硅层。在第二等离子体强度和第二抽吸强度下,将石英粉末二次熔融到坩埚外部的多孔二氧化硅层中。模具绕垂直轴旋转。通过形成电弧的电极在模具内部产生加热气体的空气等离子体。通过在连接到抽吸系统的多孔模具(1)中熔融石英粉(2)来制造二氧化硅坩埚的方法,该方法包括通过在内侧形成致密的二氧化硅表皮,将石英粉初步熔融成致密的二氧化硅层。在第二等离子体强度和第二抽吸强度下,将石英粉末二次熔融到坩埚外部的多孔二氧化硅层中。模具绕垂直轴旋转。通过形成电弧的电极在模具内部产生加热气体的空气等离子体。在模具中的第一等离子体强度和第一抽吸强度下获得致密的二氧化硅皮。第一血浆强度大于第二血浆强度,并且第一抽吸强度大于第二抽吸强度。在模具上方放置一个带有开口的盖子。在形成致密的二氧化硅表层的过程中,电极穿过开口。气流被迫通过开口朝着坩埚的内侧。在形成多孔二氧化硅层和致密的二氧化硅皮的过程中,覆盖物的面积或覆盖物与坩埚之间的距离较大。在形成致密的二氧化硅皮肤之后且在第二抽吸强度之前的第一抽吸强度期间,从坩埚打开或拉长该盖。在形成致密的二氧化硅皮的过程中,使用注射器将气体(70%(体积))引入坩埚内部。在形成致密的二氧化硅皮的过程中,盖开口的面积代表最终坩埚面积的20-70%。等离子体电弧是通过放置在覆盖层上方的电极在空气中引发的,然后通过覆盖层的开口降低电极的位置,从而形成致密的二氧化硅表皮。在抽吸系统中的压力超过100毫巴后,第一血浆强度更改为第二血浆强度。第二抽吸强度为零。包括用于制造二氧化硅坩埚的设备的独立权利要求。

著录项

  • 公开/公告号FR2954764A1

    专利类型

  • 公开/公告日2011-07-01

    原文格式PDF

  • 申请/专利权人 SAINT-GOBAIN QUARTZ S.A.S;

    申请/专利号FR20090059674

  • 发明设计人 LUC JEAN CLAUDE;

    申请日2009-12-30

  • 分类号C03B20/00;

  • 国家 FR

  • 入库时间 2022-08-21 17:45:44

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