首页> 外国专利> PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE SOLDER RESIST COMPOSITION AND PHOTOSENSITIVE SOLDER RESIST FILM, AND PERMANENT PATTERN, FORMATION METHOD THEREFOR AND PRINTED CIRCUIT BOARD

PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE SOLDER RESIST COMPOSITION AND PHOTOSENSITIVE SOLDER RESIST FILM, AND PERMANENT PATTERN, FORMATION METHOD THEREFOR AND PRINTED CIRCUIT BOARD

机译:光敏组合物,光敏阻焊剂组合物和光敏阻焊剂膜,永久性图案,形成方法及其印刷电路板

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition or the like that is excellent in insulation performance, plating resistance, and smoothness of a resist pattern side face.;SOLUTION: A photosensitive composition contains: a compound containing at least one of a group that can react with a radical and a group that can react with a heat crosslinking agent, and a triazole ring; a polymerizable compound; a photopolymerization initiator; and a heat crosslinking agent. It is preferable that the photosensitive composition further contains a carboxyl group-containing polymer compound. Preferably, the carboxyl group-containing polymer compound is an acid-modified ethylenically unsaturated group-containing polyurethane resin.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供绝缘性能,抗镀性和抗蚀剂图案侧面的光滑性优异的光敏组合物等。解决方案:光敏组合物包含:一种化合物,该化合物包含以下基团中的至少一种:能与自由基,能与热交联剂反应的基团和三唑环反应。可聚合化合物;光聚合引发剂;和热交联剂。感光性组合物优选进一步含有含羧基的高分子化合物。优选地,所述含羧基的高分子化合物是酸改性的含烯键式不饱和基团的聚氨酯树脂。版权所有:(C)2013,日本特许厅

著录项

  • 公开/公告号JP2012194534A

    专利类型

  • 公开/公告日2012-10-11

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20120013116

  • 发明设计人 TOMIZAWA HIDEKI;ARIOKA DAISUKE;

    申请日2012-01-25

  • 分类号G03F7/004;G03F7/027;H05K3/28;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 17:44:57

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