首页> 外国专利> PLATED MEMBER FOR PREVENTING OCCURRENCE OF WHISKER IN BENDING PART, ELECTRIC ELECTRONIC COMPONENT USING THE SAME, METHOD FOR PRODUCING PLATED MEMBER, AND METHOD FOR PREVENTING OCCURRENCE OF WHISKER IN PLATED MEMBER

PLATED MEMBER FOR PREVENTING OCCURRENCE OF WHISKER IN BENDING PART, ELECTRIC ELECTRONIC COMPONENT USING THE SAME, METHOD FOR PRODUCING PLATED MEMBER, AND METHOD FOR PREVENTING OCCURRENCE OF WHISKER IN PLATED MEMBER

机译:防止弯曲部的晶须发生的平板构件,使用该构件的电子部件,制造平板的方法以及防止晶状体中的晶须的发生的方法

摘要

PROBLEM TO BE SOLVED: To provide a plated member in which high solderability (wettability) to lead-free solder is achieved and the occurrence of whisker particularly in the severe bending part thereof can be suppressed or prevented, and to provide a method for forming the bending part of the plated member and a method for preventing the occurrence of whisker.;SOLUTION: The plated member is obtained by subjecting a multilayer plated material to reflow treatment and bending it at a bending part located between flat parts. The multilayer plated material has, on a conductive substrate, a second plated layer of indium at the top and a first plated layer below the second plated layer through or without other layers. In the multilayer plated material before the reflow treatment, the thickness (t1) of the first plated layer and the thickness (t2) of the second plated layer are set within a specific range and a specific diffusion layer of In is formed to prevent the occurrence of whisker.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种镀覆构件,该镀覆构件实现了对无铅焊料的高可焊性(润湿性),并且可以抑制或防止晶须的产生,特别是在其剧烈弯曲的部位,并且提供一种形成该镀覆构件的方法。解决方案:通过对多层镀覆材料进行回流处理并在位于平坦部分之间的弯曲部处进行弯曲处理,从而获得镀覆部件。多层镀层材料在导电基板上具有顶部的铟第二镀层和穿过或不具有其他层的第二镀层下方的第一镀层。在回流处理之前的多层镀覆材料中,第一镀覆层的厚度(t 1 )和第二镀覆层的厚度(t 2 )被设置在形成特定范围的In并形成特定的In扩散层以防止晶须的出现。;版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012140678A

    专利类型

  • 公开/公告日2012-07-26

    原文格式PDF

  • 申请/专利权人 KYOWA DENSEN KK;FURUKAWA ELECTRIC CO LTD:THE;

    申请/专利号JP20100293970

  • 发明设计人 SUGIE KINYA;

    申请日2010-12-28

  • 分类号C25D5/10;C25D5/12;C25D7/00;C25D5/50;C25D5/48;

  • 国家 JP

  • 入库时间 2022-08-21 17:44:12

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