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DENTAL IMPLANT AND SURFACE TREATMENT METHOD OF DENTAL IMPLANT

机译:牙种植体及牙种植体的表面处理方法

摘要

PROBLEM TO BE SOLVED: To provide an implant that has macro pores having an inner diameter with the level of several tens of μm and micro pores having an inner diameter of 1-2 μm while having pores with the nanometer level in the surface.;SOLUTION: The implant has the surface that has the macro pores having the inner diameter with the level of several tens of μm and micro pores having the inner diameter of 1-2 μm and comprises nano discharge craters having an inner diameter with the level of several tens of nm. The surface treatment method includes steps of producing the macro pores having the inner diameter with the level of several tens of μm by acid treatment of the surface; producing the micro pores having the inner diameter of 1-2 μm by blast treatment of the implant surface; and producing the nano discharge craters having an inner diameter with the level of several tens of nm by anodic oxidation treatment of the implant surface.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种植入物,其具有内径为几十μm的宏观孔和内径为1-2μm的微孔,而内径为纳米水平的孔。解决方案:植入物的表面具有内径为几十微米的大孔和内径为1-2μm的微孔,并包含具有内径具有几十纳米的水平。表面处理方法包括通过对表面进行酸处理来产生内径为几十μm的大孔的步骤;通过对植入物表面进行喷砂处理产生内径为1-2μm的微孔;并通过对植入物表面进行阳极氧化处理,生产出内径为几十纳米的纳米级放电弹坑。版权所有:(C)2012,日本特许会计师事务所

著录项

  • 公开/公告号JP2012143416A

    专利类型

  • 公开/公告日2012-08-02

    原文格式PDF

  • 申请/专利权人 GC CORP;

    申请/专利号JP20110004444

  • 申请日2011-01-13

  • 分类号A61C8/00;A61L27/00;

  • 国家 JP

  • 入库时间 2022-08-21 17:43:58

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