DEFECT INSPECTION DEVICE, DEFECT INFORMATION ACQUISITION DEVICE AND DEFECT INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a defect inspection device, a defect information acquisition device and a defect inspection method, capable of optimizing further an acquisition amount of a scattered light signal regarding the defect by improving a detection accuracy of the defect to be as the detection object.;SOLUTION: The defect inspection device comprises: an inspection light irradiation device 20 for obliquely irradiating a wafer 100 on a specimen support 11 by the inspection light 21; scattered light detectors 30a-30b for detecting scattered light beams 1a-1c from the wafer 100; a defect determination section 45 for logically computing scattered light signals 2a-2b obtained by the scattered light detectors 30a-30b as to the scattered light beams 1a-1c simultaneously generated from a same coordinate on the wafer 100 to determine whether the scattered light signal is a defect signal scattered by the defect or not, and for outputting the scattered light signal only determined as defect signal; a storage section 56 for storing the scattered light signal output from a defect determination section 45; and an operation section 52 for setting a logical arithmetic formula to be used as a criterion of the defect in the defect determination section 45 by combining one selected from a plurality of logical operations or the plural number.;COPYRIGHT: (C)2012,JPO&INPIT