首页> 外国专利> Low molecular weight (meth) acrylic polymer that does not contain a sulfur-containing compound, metal compound and halogen compound and has a small amount of residual monomer, a method for producing the (meth) acrylic polymer, and the (meth) acrylic polymer Use of

Low molecular weight (meth) acrylic polymer that does not contain a sulfur-containing compound, metal compound and halogen compound and has a small amount of residual monomer, a method for producing the (meth) acrylic polymer, and the (meth) acrylic polymer Use of

机译:不包含含硫化合物,金属化合物和卤素化合物且残留单体少的低分子量(甲基)丙烯酸类聚合物,(甲基)丙烯酸类聚合物的制造方法和(甲基)丙烯酸类聚合物用于

摘要

The subject of the disclosure concerns C8 or higher, linear or branched fatty chain (meth)acrylic polymers possibly containing at least one ethylene unsaturation, having a weight average molecular weight Mw of less than 20,000 g/mole, free of sulphur-containing, metallic and halogenated compounds and with a residual monomer content measured by GPC of no more than 10% by weight, preferably no more than 7% by weight. A further subject of the disclosure is the synthesis method and the uses of these polymers.
机译:本公开的主题涉及C 8或更高的直链或支链脂肪链(甲基)丙烯酸聚合物,其可能包含至少一种乙烯不饱和键,其重均分子量Mw小于20,000 g / mol,不含含硫的金属卤代化合物和通过GPC测量的残余单体含量不超过10重量%,优选不超过7重量%。本公开的另一个主题是这些聚合物的合成方法和用途。

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