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SEMICONDUCTOR EXPOSURE DEVICE, SEMICONDUCTOR INSPECTION DEVICE, AND EXPOSURE DEVICE FAULT DIAGNOSIS SYSTEM
SEMICONDUCTOR EXPOSURE DEVICE, SEMICONDUCTOR INSPECTION DEVICE, AND EXPOSURE DEVICE FAULT DIAGNOSIS SYSTEM
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机译:半导体曝光设备,半导体检查设备和曝光设备故障诊断系统
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摘要
PROBLEM TO BE SOLVED: To detect an abnormality of an EUV light source in a vacuum case at an early stage, without discharging electricity into the air.;SOLUTION: There is provided a semiconductor exposure device comprising: an EUV light source configured to generate plasma under a reduced pressure equal to or lower than an atmospheric pressure and capture EUV light emitted by the plasma; a first optical system configured to lead the EUV light from the EUV light source to a mask on which a desired semiconductor pattern is formed; and a second optical system configured to lead light reflected from the mask or light that has passed through the mask to a sample. The semiconductor exposure device comprises a detection module 180 configured to detect acoustic emission of the light source, and detects an abnormality of the light source based on an output of the detection module 180.;COPYRIGHT: (C)2012,JPO&INPIT
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