首页> 外国专利> METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURED BY USING THE SAME, METHOD FOR MANUFACTURING ELECTRIC AND ELECTRONIC COMPONENT, AND ELECTRIC AND ELECTRONIC COMPONENT MANUFACTURED BY USING THE SAME

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURED BY USING THE SAME, METHOD FOR MANUFACTURING ELECTRIC AND ELECTRONIC COMPONENT, AND ELECTRIC AND ELECTRONIC COMPONENT MANUFACTURED BY USING THE SAME

机译:制造半导体装置的方法,使用该半导体装置制造的半导体装置,制造电子和电气部件的方法以及通过使用该制造的电子电气部件

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device which has superior productivity without a flax washing process, and can reduce warpage caused by grinding a back surface of a semiconductor wafer, and the semiconductor device manufactured by using the same.;SOLUTION: A method for manufacturing a semiconductor device comprises a first step for forming a resin composition layer with a flux function and a back grind tape on a circuit surface of a semiconductor wafer where a first connecting electrode is provided thereon, in this order; a second step for grinding an opposing surface to the circuit surface of the semiconductor wafer; a third step for laminating a dicing tape on the opposing surface to the circuit surface of the semiconductor wafer; a forth step for peeling off the back grind tape; a fifth step for dividing the resin composition layer with the flux function and the semiconductor wafer into pieces to obtain a semiconductor chip having the resin composition layer with the flux function; and additional two steps.;COPYRIGHT: (C)2012,JPO&INPIT
机译:本发明要解决的问题是提供一种半导体器件的制造方法以及使用该半导体器件的半导体器件,该半导体器件的制造方法无需进行亚麻洗涤即可具有优异的生产率,并且无需进行亚麻清洗处理就可以减少因研磨半导体晶片的背面而引起的翘曲。解决方案:一种半导体器件的制造方法,包括:第一步,在其上设置有第一连接电极的半导体晶片的电路表面上,依次形成具有助熔剂功能的树脂组合物层和背面研磨带;第二步骤,用于研磨与半导体晶片的电路表面相对的表面;第三步骤,在与半导体晶片的电路表面相对的表面上层压切割带。第四步骤,剥离背面研磨带。第五步骤,将具有助焊剂功能的树脂组合物层和半导体晶片分割成片,得到具有具有助焊剂功能的树脂组合物层的半导体芯片。以及另外两个步骤。;版权:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012015444A

    专利类型

  • 公开/公告日2012-01-19

    原文格式PDF

  • 申请/专利权人 SUMITOMO BAKELITE CO LTD;

    申请/专利号JP20100152933

  • 发明设计人 MAEJIMA KENZO;

    申请日2010-07-05

  • 分类号H01L21/60;H01L23/29;H01L23/31;H01L21/304;H01L21/301;

  • 国家 JP

  • 入库时间 2022-08-21 17:42:53

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