首页> 外国专利> METHOD, SYSTEM, AND POLYMER SUBSTANCE RELATING TO CONSIDERATION OF H2O LEVELS PRESENT WITHIN AN ATMOSPHERIC-PRESSURE NITROGEN DIELECTRIC-BARRIER DISCHARGE

METHOD, SYSTEM, AND POLYMER SUBSTANCE RELATING TO CONSIDERATION OF H2O LEVELS PRESENT WITHIN AN ATMOSPHERIC-PRESSURE NITROGEN DIELECTRIC-BARRIER DISCHARGE

机译:有关考虑大气压氮气介电屏障放电中H 2 O水平的方法,系统和聚合物物质

摘要

PROBLEM TO BE SOLVED: To provide methods that utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances.;SOLUTION: The atmospheric-pressure nitrogen dielectric-barrier discharge may be maintained with a level of H2O below a pre-defined amount, by measuring and controlling the H2O within an atmospheric-pressure nitrogen dielectric-barrier discharge treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H2O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles, by controlling the H2O level within the treater based on these analyses of the treated polymer.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供利用大气压氮介电阻挡层放电处理聚合物表面的方法;解决方案:大气压氮介电阻挡层放电可以保持在H 的水平通过测量和控制常压氮介电阻挡放电处理机中的H 2 O,将2 O降至预定量以下,以对聚合物进行表面处理产生理想的特性。此外,可以根据预定量或根据另一参数例如对所得聚合物表面的分析来测量和控制H 2 -Sub 2 O水平。例如,通过将H 2 O的水平控制在聚合物表面,可以基于洗涤和未洗涤的前进接触角为聚合物表面提供最佳的添加的氮与氧的比和/或最佳的稳定性。基于对处理过的聚合物的这些分析得出的处理者。;版权所有:(C)2012,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号