DEVICE FOR POLISHING REAR SURFACE OF SUBSTRATE, SYSTEM FOR POLISHING REAR SURFACE OF SUBSTRATE AND METHOD FOR POLISHING REAR SURFACE OF SUBSTRATE, AND RECORDING MEDIUM HAVING RECORDED PROGRAM FOR POLISHING REAR SURFACE OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To prevent decrease in throughput or degradation in a substrate due to polishing of a rear surface of the substrate, and to reduce labor, time and cost necessary for replacing a polishing member.;SOLUTION: There are provided a rear substrate surface polishing device (9) polishing a rear surface of a substrate (5), a rear substrate surface polishing system (1) including the rear substrate surface polishing device (9), a rear substrate surface polishing method and a substrate rear surface polishing program used in the rear substrate surface polishing device (9). In particular, the rear surface of the substrate (5) is polished by substrate polishing means (16, 17) in accordance with information relating to the process on the substrate (5) in a prior step. Further, polishing is carried out by the polishing means (16, 17) in a polishing area determined on the basis of the information relating to the process on the substrate (5) in the prior step. Furthermore, the polishing is performed by using any one or all of a plurality of substrate polishing means (16, 17) determined on the basis of information relating to the process on the substrate (5) in the prior step.;COPYRIGHT: (C)2012,JPO&INPIT