首页> 外国专利> METHOD FOR MEASURING THIN ARSENIC CONCENTRATION UNDER EXISTENCE OF PHOSPHORIC ACID AND SILICA ION

METHOD FOR MEASURING THIN ARSENIC CONCENTRATION UNDER EXISTENCE OF PHOSPHORIC ACID AND SILICA ION

机译:磷酸和硅离子存在下稀薄砷浓度的测定方法

摘要

PROBLEM TO BE SOLVED: To detect arsenic with low concentration which may be contained in mining waste water, etc. in a short time.;SOLUTION: A method for measuring thin arsenic concentration in a sample liquid in which phosphoric acid and a silica ion exist, based on flow injection analysis using ammonium molybdate consists of: a first step of reacting the sample with an oxidant or a reductant; and a second step of reacting the reacted sample with a coloring agent. The reaction temperature with the coloring agent is about 70°C, and the reaction time is about 1.4 minutes. The sample liquid, a standard liquid, an oxidant solution, and a reductant solution are carried to a duct for measurement by a carrier (water), and sodium dodecyl sulfate is dissolved and added to a coloring agent solution and the carrier.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:短时间内检测采矿废水等中可能含有的低浓度砷;解决方案:一种测量存在磷酸和硅离子的样品液中稀砷浓度的方法,基于使用钼酸铵的流动注射分析,包括:第一步,使样品与氧化剂或还原剂反应;第二步是使反应后的样品与着色剂反应。与着色剂的反应温度为约70℃,反应时间为约1.4分钟。样品液,标准液,氧化剂溶液和还原剂溶液通过载体(水)被运送到导管进行测量,十二烷基硫酸钠被溶解并添加到着色剂溶液和载体中。 (C)2012,日本特许厅&INPIT

著录项

  • 公开/公告号JP2012058128A

    专利类型

  • 公开/公告日2012-03-22

    原文格式PDF

  • 申请/专利权人 DOWA TECHNO ENGINEERING CO LTD;

    申请/专利号JP20100203066

  • 发明设计人 MATSUSHIMA EIJI;YAMAGUCHI SHOICHI;

    申请日2010-09-10

  • 分类号G01N31/00;G01N31/22;G01N21/77;G01N21/78;

  • 国家 JP

  • 入库时间 2022-08-21 17:41:17

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