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WAVEFRONT SHAPE MEASUREMENT METHOD AND WAVEFRONT SHAPE MEASUREMENT DEVICE

机译:波形形状测量方法和波形形状测量装置

摘要

PROBLEM TO BE SOLVED: To provide a wavefront shape measurement method for measuring a surface shape of a large diameter optical system to be inspected and a wavefront shape measurement device for measuring a surface shape of a large diameter optical system to be inspected.;SOLUTION: A wavefront shape measurement method for measuring surface shape of an optical system to be inspected comprises: a liquid reflection surface forming step in which a liquid reflection surface (EH) having a rotational paraboloidal shape concave in a gravity direction is formed by spinning a container (YK) containing a liquid (ET) around a rotational axis (KJ) extending in the gravity direction; a disposing step in which a reference plane mirror (KH) having a reference plane (HM) is disposed so as to face the liquid reflection surface; and a measurement step in which light flux having a coherency is irradiated to the liquid reflection surface from an interferometer (KS), the light flux reflected by the liquid reflection surface is reflected by the reference plane mirror, and the light flux returned to the interferometer again via the liquid reflection surface is allowed to interfere to measure the surface shape of the reference plane mirror.;COPYRIGHT: (C)2012,JPO&INPIT
机译:要解决的问题:提供一种用于测量要检查的大直径光学系统的表面形状的波前形状测量方法,以及一种用于测量要检查的大直径光学系统的表面形状的波前形状测量装置。用于测量要检查的光学系统的表面形状的波前形状测量方法包括:液体反射表面形成步骤,在该步骤中,通过旋转容器形成具有在重力方向上凹入的旋转抛物面形状的液体反射表面(EH)( YK)包含围绕重力方向延伸的旋转轴(KJ)的液体(ET);布置步骤,其中具有参考平面(HM)的参考平面镜(KH)被布置为面对液体反射表面;以及从干涉仪(KS)向液体反射面照射具有相干性的光束,并由基准面镜反射由液体反射面反射的光束,并返回至干涉仪的光束的测定工序。再次通过液体反射表面进行干涉以测量参考平面镜的表面形状。;版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2011242347A

    专利类型

  • 公开/公告日2011-12-01

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20100116839

  • 发明设计人 NEGISHI TAKETOSHI;

    申请日2010-05-21

  • 分类号G01B9/02;G01B11/24;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:54

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