MEASUREMENT METHOD AND MEASUREMENT MARKS FOR PATTERN SHIFT AMOUNT BETWEEN EXPOSURE REGIONS

摘要

PROBLEM TO BE SOLVED: To provide a measurement method and measurement marks for a pattern shift amount between exposure regions, which allow a speedy and real-time measurement and improvement in the failure detection rate and yield for the pattern shift amount between the exposure regions.;SOLUTION: The method includes: a step of forming at least one pair of conductive measurement marks having a predetermined positional relation by two exposure and other patterning processes; and a step where an electrical characteristic examination is performed for at least one pair of the conductive measurement marks and if the electrical characteristic does not correspond to the predetermined positional relation, the exposure pattern shift amount between the exposure regions in two exposure processes is determined to fail and if the electrical characteristic corresponds to the predetermined positional relation, the exposure pattern shift amount between the exposure regions in two exposure processes is determined to pass. The present invention applies to the measurement of the pattern shift amount between the exposure regions.;COPYRIGHT: (C)2012,JPO&INPIT