Computer-implemented method for detecting and / or sorting defects in reticle design patterns

摘要

Various methods implemented in the computer, is provided. By using in combination with one or more characteristics of the region adjacent to the individual defects, the priority information associated with the individual defects, one method for sorting defects in the design pattern of the reticle inspection I includes the step of searching for defects of interest in the data. Priority information, corresponding to the modulation level that are associated with the individual defects. Test data is generated by comparing the images with each other reticle that are generated for different values ​​of lithographic variables. The image includes an image that is modulated and at least one at least one reference image. Composite reference image can be generated from the reference image of two or more. The method also, I includes the step of allocating the defects that interest the identifier of one or more. For example, (s) identifiers, which may include indicator identifying whether to use for further processing defects of interest (or) and defect classification.