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Side-chain unsaturated polymer, radiation-sensitive resin composition and a spacer for a liquid crystal display device

机译:侧链不饱和聚合物,辐射敏感性树脂组合物和用于液晶显示装置的隔离物

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that is highly sensitive, gives a satisfactory spacer shape even with an exposure amount of not higher than 1,000 J/m2, can form a spacer for liquid crystal display devices excellent in rubbing resistance, adhesion to a transparent substrate, heat resistance and flexibility, and is excellent in preservation stability and the like; a polymer useful as a constituting element of the composition and the like; and the like.;SOLUTION: The polymer is formed by causing a compound represented by formula (1) (wherein R1 is a hydrogen atom or a methyl group; R2 is an ethylene group or a propylene group; and n is an integer of 1-5) to react with a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides with (a2) an unsaturated compound bearing at least one hydroxy group in one molecule. The radiation-sensitive resin composition comprises the polymer, a polymerizable unsaturated compound and a radiation-sensitive polymerization initiator.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:为了提供高感光度的放射线敏感性树脂组合物,即使暴露量不超过1,000 J / m 2 ,也能给出令人满意的间隔物形状,可以形成用于液晶显示装置的耐摩擦性,与透明基板的密合性,耐热性和挠性优异,保存稳定性等优异。用作组合物等的构成元素的聚合物; SOLUTION:聚合物是由式(1)表示的化合物形成的,其中R 1 是氢原子或甲基; R 2 是亚乙基或亚丙基;并且n是1-5的整数,以与(a1)的选自不饱和羧酸和不饱和羧酸酐中的至少一种与(a2)不饱和羧酸的共聚物反应在一个分子中带有至少一个羟基的化合物。放射线敏感性树脂组合物包含聚合物,可聚合的不饱和化合物和放射线敏感性聚合引发剂。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP4985140B2

    专利类型

  • 公开/公告日2012-07-25

    原文格式PDF

  • 申请/专利权人 JSR株式会社;

    申请/专利号JP20070163254

  • 发明设计人 一戸 大吾;杉 龍司;

    申请日2007-06-21

  • 分类号C08F8/30;G03F7/027;G02F1/1339;C08F290/12;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:16

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