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Gray-tone mask blank, gray-tone mask, and product processing label or product information labeling method of formation

机译:灰口罩坯,灰口罩以及产品加工标签或产品信息标签的形成方法

摘要

PROBLEM TO BE SOLVED: To provide a gray-tone mask blank, on which a marker can be formed by a lithographic process of removing either a light-shielding film or a translucent film, even when a marker for product processing or a marker for product information is to be formed of a translucent film and a light-shielding film, and a marker which is readable by utilizing the reflected light at a predetermined wavelength for reading can be formed, and to provide a method for forming a marker for product processing or a marker for product information which is to be formed on a gray-tone mask.;SOLUTION: The gray-tone mask blank is such that: a translucent film and a light-shielding film are formed of films, having etching characteristics different from each other on a transparent substrate; the reflectance of each of the translucent film and the light-shielding film is not more than 30% at the wavelength of exposure light; the difference in the reflectance between the translucent film and the light-shielding film at a predetermined wavelength in the longer wavelength side than the wavelength of exposure light is larger than the difference in the reflectance at the wavelength of exposure light; and the light-transmitting film and the light-shielding film in a gray-tone mask configuration can be identified by the difference in the reflectance between a translucent part and a light-shielding part, by having the translucent part and the light-shielding part irradiated with light at the predetermined wavelength, through either the top or the back surfaces of the gray-tone mask.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种灰色调的掩模坯料,即使当用于产品加工的标记物或用于产品的标记物时,也可以通过光刻工艺在其上去除遮光膜或半透明膜的方式形成标记物由半透明膜和遮光膜形成信息,并且可以形成通过利用预定波长的反射光进行读取而可读取的标记,并提供一种形成用于产品加工或制造的标记的方法。解决方案:该灰色掩膜毛坯是这样的:半透明膜和遮光膜由膜形成,其蚀刻特性各不相同。其他在透明基板上;半透明膜和遮光膜在曝光波长处的反射率不大于30%。在比曝光光的波长更长的波长侧中的预定波长处的半透明膜和遮光膜之间的反射率的差大于在曝光光的波长处的反射率的差;并且,通过具有透光部和遮光部,可以通过透光部和遮光部之间的反射率的差异来识别灰色调掩模结构的透光膜和遮光膜。通过灰阶光罩的顶面或背面用预定波长的光照射。;版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP4849276B2

    专利类型

  • 公开/公告日2012-01-11

    原文格式PDF

  • 申请/专利权人 信越化学工業株式会社;

    申请/专利号JP20080209125

  • 发明设计人 深谷 創一;

    申请日2008-08-15

  • 分类号G03F1/58;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:10

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