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And copper oxide etch residue removal, acidic cleaning composition of aqueous for the prevention of copper electrodeposition
And copper oxide etch residue removal, acidic cleaning composition of aqueous for the prevention of copper electrodeposition
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机译：和氧化铜蚀刻残留物的去除，酸性清洗液的水溶液用于防止铜的电沉积
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摘要
A highly aqueous acidic cleaning composition for copper oxide etch removal from Cu-dual damascene microelectronic structures and wherein that composition prevents or substantially eliminates copper redeposition on the Cu-dual damascene microelectronic structure.
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