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Method of failure analysis semiconductor integrated circuit, failure analysis equipment, and failure analysis program

机译:故障分析半导体集成电路的方法,故障分析设备和故障分析程序

摘要

PROBLEM TO BE SOLVED: To provide a method, apparatus and program for failure analysis of a semiconductor integrated circuit for accurately extracting an abnormal signal of the semiconductor integrated circuit obtained from a semiconductor inspection apparatus and a related circuit.;SOLUTION: The failure analysis method has: a signal detecting step of obtaining a coordinate of an apparatus coordinate system in an analysis data with regard to an abnormal signal data included in the analysis data of the semiconductor integrated circuit obtained from the semiconductor inspection apparatus; a coordinate converting step of obtaining a correspondence between the coordinate of the apparatus coordinate system and a coordinate of a design coordinate system in a design data of the semiconductor integrated circuit with regard to a plurality of reference points of the semiconductor integrated circuit, and obtaining a coordinate conversion equation between the apparatus coordinate system and the design coordinate system; an error calculating step of obtaining a position error between the coordinate of the apparatus coordinate system and the coordinate of the design coordinate system by the coordinate conversion equation; a circuit extracting step of extracting the circuit related to the abnormal signal in the design data from the coordinate of the abnormal signal in the apparatus coordinate system by using the coordinate conversion equation and the position error.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种用于半导体集成电路的故障分析的方法,设备和程序,以准确地提取从半导体检查设备和相关电路获得的半导体集成电路的异常信号。具有信号检测步骤,该信号检测步骤针对从半导体检查设备获得的半导体集成电路的分析数据中包括的异常信号数据,获得分析数据中的设备坐标系的坐标;坐标转换步骤,针对半导体集成电路的多个参考点,获得半导体集成电路的设计数据中的设备坐标系的坐标与设计坐标系的坐标之间的对应关系,并获得设备坐标系与设计坐标系之间的坐标转换方程式;误差计算步骤,通过坐标转换方程式获得装置坐标系的坐标与设计坐标系的坐标之间的位置误差。电路提取步骤,通过使用坐标转换方程和位置误差从设备坐标系中的异常信号的坐标中提取与设计数据中的异常信号有关的电路。COPYRIGHT:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP4917115B2

    专利类型

  • 公开/公告日2012-04-18

    原文格式PDF

  • 申请/专利号JP20090035576

  • 发明设计人 二階堂 正人;

    申请日2009-02-18

  • 分类号G01R31/302;G01R31/28;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 17:38:08

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