Being manner of measurement null optical measuring the stiffness coefficient of the dielectric

摘要

The optical measurement system (50), silicon dioxide, it seems like the carbon dope oxide which covers the metal or semiconductor baseplate, optically the transparent dielectric membrane (310), data analysis method in order to obtain elastic coefficient is had. Refractive index is measured with the polarized light analyzer, wave length of the laser beam is measured, using the laser spectrometer. Seeking speed of sound v from the angle of refraction where it was required the optical pulse which decides the focus on the wafer surface (325) it led angle of refraction, moved the wafer to z direction and coordinate of the 1st deck (x₁, y₁, z₁) (330) measured, optical pulse (325) led on the wafer surface and coordinate of the 2nd deck (x₂, y₂, z₂) by measuring, it calculated incidence angle making use of these coordinates, calculated angle of refraction from the incidence angle which was calculated, calculated, making use of the speed of sound v which it requested cubic measureElastic coefficient is calculated. In order to hold down fluctuation of the result where every tool is obtained approximately 0.5% or less, also calibration of the hardware and adjustment of the optical measurement system are offered. Selective figure Figure 3