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Method for forming a phosphorus-containing dopants, an area which phosphorus is doped in the semiconductor base material and with a phosphorus-containing dopant
Method for forming a phosphorus-containing dopants, an area which phosphorus is doped in the semiconductor base material and with a phosphorus-containing dopant
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机译:形成含磷掺杂剂的方法,在半导体基材中掺杂有磷的区域以及含磷掺杂剂
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摘要
The provided method of forming a region doped with phosphorus phosphorus-containing dopant into the semiconductor material, and a method for producing a phosphorus-containing dopant. In one embodiment, the phosphorus-containing dopant, phosphorus source comprises a combination of these phosphorus-containing salt, phosphorus-containing acid, or phosphorus-containing anions; the; liquid medium; and combinations of these alkaline materials, or cation, from the alkaline material including. [Selection] Figure Figure 1
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