Unevenness inspection equipment and villages inspection method

摘要

PROBLEM TO BE SOLVED: To provide a device capable of accurately detecting film thickness uneveness.;SOLUTION: The uneveness inspection device 1 comprises a stage 2 for holding a substrate 9, a light-emitting section 3 for emitting linear light toward an upper face 91 of the substrate 9 having a film 92, a light receiver 4 for receiving reflected light from the substrate 9, a waveband change mechanism 5 that is arranged between the substrate 9 and receiver 4 and changes the waveband of the light, a moving mechanism 21 moving on a stage 2, and an inspection section 7 for inspecting the film thickness uneveness, based on the intensity distribution of the received light. When a selected optical filter 51a is changed by the waveband change mechanism 5, the irregularity inspection device 1 corrects the influence due to by the optical characteristics of each optical filter 51 and influence by variations in CCD sensitivity of a line sensor 41 accompanying the change in the selected waveband, based on correction information corresponding to the selected waveband (selected optical condition) previously stored in a correction information storage section 76, and then inspect the film thickness uneveness. As a result, the film thickness uneveness can be detected accurately.;COPYRIGHT: (C)2007,JPO&INPIT