Being the electronic line drawing picture data generation method which generates the drawing data in order to draw with the multiple

摘要

PROBLEM TO BE SOLVED: To provide a method, device, and program for creating electron beam lithography data by which the creating time and plotting time of lithography data for multiple plotting can be shortened by reducing the amount of the data and, at the same time, it can be verified that whether or not the multiplicity of the lithography data is appropriately set; and to provide electron beam lithography equipment.;SOLUTION: In the method, lithography data to be plotted on an object to be exposed by multiple plotting by using an electron beam are generated. The method includes a data conversion step of deciding the multiplicity of patterns to be plotted for each pattern so that patterns having different multiplicities may exist in a mixed state, and a verification step of calculating the multiplicities of patterns in the lithography data generated in the data conversion step.;COPYRIGHT: (C)2005,JPO&NCIPI