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Production method of optical thin film evaporation device and optical thin film

机译:光学薄膜蒸镀装置的制造方法及光学薄膜

摘要

Topic At the same time the optical thin film evaporation device, and the production cost which can produce the optical thin film which possesses satisfactory optical quality inexpensive production method of the optical thin film which possesses satisfactory optical quality is offered.SolutionsBeing the optical thin film evaporation device evaporating the evaporation substance to base substance 14 inside vacuum container 10, distribution facilities it is done inside vacuum container 10, base substance retention expedient opposing to rotary expedient and the base substance 14 which, turn 12 of the dome type which keeps base substance 14 and base substance retention expedient 12 it has niyutoraraiza 40 which irradiates the electron the ion source vis-a-vis 38 which irradiates the ion the evaporation expedient vis-a-vis 34 which is provided and base substance 14 and base substance 14. As for ion source 38, angle of the axis where the ion is irradiated from ion source 38 vis-a-vis the perpendicular line for the surface of base substance 14, ratio of distance of vertical direction in the axis of rotation center of base substance retention expedient and the center of ion source 38, distribution facilities is done in the position where it becomes the range of the 1.2 or less of 0.5 or more below the 40 above the 8 , vis-a-vis the diameter of base substance retention expedient 12.
机译:<主题>同时提供光学薄膜蒸镀装置,以及能够生产具有令人满意的光学质量的光学薄膜的生产成本,提供了具有令人满意的光学质量的光学薄膜的廉价制造方法。薄膜蒸发装置将蒸发物质蒸发到真空容器10内的基础物质14上,在真空容器10内完成分配设施,基础物质的保留权宜与旋转权宜相反,基础物质14变成圆顶形的保持基础的圆顶型物质14和基本物质保留权宜物12具有将电子辐射到离子源38上的Niyutoraraiza 40和将基本物质14和基本物质14辐射给蒸发离子34的离子源38。对于离子源38,相对于pe从离子源38照射离子的轴的角度基体材料14的表面的垂直线,基体材料保留权宜的旋转中心与离子源38的中心在垂直方向上的距离的比值,在达到1.2的范围的位置进行分配相对于基础物质保留权重12的直径,在8之上的40之下小于0.5或更大。

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