PLASMA PROBE AND METHOD FOR PLASMA DIAGNOSTICS

摘要

Device and method for monitoring a plasma in a chamber of a plasma reactor is are disclosed. In one aspect, the method includes measuring plasma parameter data at a surface of a single planar Langmuir probe in contact with the plasma. A biasing capacitor is connected between the single planar Langmuir probe and a DC-bias source. Subsequently a discharge current of the biasing capacitor as a result of the DC-bias is measured, and a probe potential at the single probe during the discharge is measured. The measurements can be used to detect presence and/or thickness of a dielectric film on the probe surface.