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Projection system and projector with widened projection of light for projection onto a close object

机译:投射系统和投射器,具有扩大的光投射能力,可以投射到近距离物体上

摘要

A projection system includes a first projector and a second projector configured to project light on a light receiving surface according to an image signal. The first projector and the second projector direct light to be supplied to the light receiving surface in a direction along the light receiving surface. A part of an image projected by the first projector overlaps with a part of an image projected by the second projector on the light receiving surface.
机译:一种投影系统,包括:第一投影仪和第二投影仪,被配置为根据图像信号将光投影在光接收表面上。第一投影仪和第二投影仪将光沿沿着光接收表面的方向引导到光接收表面。由第一投影仪投影的图像的一部分与由第二投影仪投影的图像的一部分在光接收表面上重叠。

著录项

  • 公开/公告号US8267524B2

    专利类型

  • 公开/公告日2012-09-18

    原文格式PDF

  • 申请/专利权人 EIJI MORIKUNI;

    申请/专利号US20090354144

  • 发明设计人 EIJI MORIKUNI;

    申请日2009-01-15

  • 分类号G03B21/14;G03B21/26;

  • 国家 US

  • 入库时间 2022-08-21 17:31:27

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