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Method of forming gas barrier layers including a change in pressure, a gas barrier layer formed by the method, and a gas barrier film
Method of forming gas barrier layers including a change in pressure, a gas barrier layer formed by the method, and a gas barrier film
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机译:形成包括压力变化的气体阻挡层的方法,通过该方法形成的气体阻挡层和气体阻挡膜
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摘要
A method of forming a gas barrier layer comprises: forming a first layer over a substrate by plasma-enhanced CVD at a first pressure, at least a part of a surface of the substrate being made of an organic material; and forming a second layer on the first layer by plasma-enhanced CVD at a second pressure which is lower than the first pressure.
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