3×108A/cm2Q109A/cm2,(1)1.39T/λ+4.51Wλ1.53T/λ+4.44(2)107A/cm2,(3) ]]> "/> Nanowire and memory device using it as a medium for current-induced domain wall displacement
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Nanowire and memory device using it as a medium for current-induced domain wall displacement

机译:纳米线和使用其作为电流感应畴壁位移的介质的存储设备

摘要

Disclosed herein are a nanowire and a current-induced domain wall displacement-type memory device using the same. The nanowire has perpendicular magnetic anisotropy and is configured in a manner that when a parameter Q, calculated by a saturation magnetization per unit area, a domain wall thickness and a spin polarizability of a ferromagnet that is a constituent material of the nanowire, has a value of (formula 1 should be inserted here) a domain wall thickness, a width “*′” and a thickness −* of the nanowire satisfy the relationship of (formula 2 should be inserted here) The present invention can be designed such that a current density capable of driving a memory device utilizing the current-driven domain wall displacement has a value of less than (formula 3 should be inserted here), through the determination of the optimal nanowire width and thickness satisfying a value of a critical current density, Jc for the domain wall displacement below a certain value required for commercialization, for a given material in the nanowire with perpendicular anisotropy. According to such a configuration of the present invention, the current density required for the domain wall displacement can be at least 10 times or further lowered than the current density in currently available nano wires. Therefore, the present invention is capable of solving the problems associated with high power consumption and malfunction of the device due to generation of Joule heat and is also capable of achieving low-cost production of memory devices.; <math overflow="scroll"><mtable><mtr><mtd><mrow><mrow><mrow><mn>3</mn><mo>×</mo><msup><mn>10</mn><mn>8</mn></msup><mo>⁢</mo><mstyle><mspace width="0.8em" height="0.8ex" /></mstyle><mo>⁢</mo><mi>A</mi><mo>⁢</mo><mstyle><mtext>/</mtext></mstyle><mo>⁢</mo><msup><mi>cm</mi><mn>2</mn></msup></mrow><mo>≤</mo><mi>Q</mi><mo>≤</mo><mrow><msup><mn>10</mn><mrow><mn>9</mn><mo>⁢</mo><mstyle><mspace width="0.6em" height="0.6ex" /></mstyle></mrow></msup><mo>⁢</mo><mi>A</mi><mo>⁢</mo><mstyle><mtext>/</mtext></mstyle><mo>⁢</mo><msup><mi>cm</mi><mn>2</mn></msup></mrow></mrow><mo>,</mo></mrow></mtd><mtd><mrow><mo>(</mo><mn>1</mn><mo>)</mo></mrow></mtd></mtr><mtr><mtd><mrow><mrow><mfrac><mn>1.39</mn><msqrt><mrow><mi>T</mi><mo>/</mo><mi>λ</mi></mrow></msqrt></mfrac><mo>+</mo><mn>4.51</mn></mrow><mo>≤</mo><mfrac><mi>W</mi><mi>λ</mi></mfrac><mo>≤</mo><mrow><mfrac><mn>1.53</mn><msqrt><mrow><mi>T</mi><mo>/</mo><mi>λ</mi></mrow></msqrt></mfrac><mo>+</mo><mn>4.44</mn></mrow></mrow></mtd><mtd><mrow><mo>(</mo><mn>2</mn><mo>)</mo></mrow></mtd></mtr><mtr><mtd><mrow><mrow><msup><mn>10</mn><mn>7</mn></msup><mo>⁢</mo><mstyle><mspace width="0.8em" height="0.8ex" /></mstyle><mo>⁢</mo><mi>A</mi><mo>⁢</mo><mstyle><mtext>/</mtext></mstyle><mo>⁢</mo><msup><mi>cm</mi><mn>2</mn></msup></mrow><mo>,</mo></mrow></mtd><mtd><mrow><mo>(</mo><mn>3</mn><mo>)</mo></mrow></mtd></mtr></mtable></math>
机译:本文公开了纳米线和使用该纳米线的电流感应畴壁位移型存储器件。纳米线具有垂直的磁各向异性,并且以如下方式构造:当通过单位面积的饱和磁化强度计算出的参数Q,作为纳米线的构成材料的铁磁体的畴壁厚度和自旋极化率具有值时, (此处应插入公式1)的纳米线的畴壁厚度,宽度“ *'”和厚度-*满足以下关系(此处应插入公式2)。本发明可以设计成使得电流通过确定满足临界电流密度Jc值的最佳纳米线宽度和厚度,能够利用电流驱动畴壁位移来驱动存储器件的密度的值小于(此处应插入公式3)。对于纳米线中具有垂直各向异性的给定材料,其畴壁位移低于商品化所需的某个值。根据本发明的这种配置,畴壁位移所需的电流密度可以比当前可用的纳米线中的电流密度至少十倍或更低。因此,本发明能够解决与由于焦耳热的产生而导致的高功耗和装置故障相关的问题,并且还能够实现存储装置的低成本生产。 <![CDATA [<数学溢出=“ scroll”> 3 × 10 8 A / cm 2 Q 10 9 A / cm 2 1 1.39 T / λ + 4.51 W λ 1.53 T / λ + 4.44 2 10 7 A / cm 2 3 ]]>

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