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Methods and systems for metal-assisted chemical etching of substrates
Methods and systems for metal-assisted chemical etching of substrates
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机译:用于金属辅助化学蚀刻衬底的方法和系统
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摘要
Disclosed herein are various embodiments related to metal-assisted chemical etching of substrates on the micron, sub-micron and nano scales. In one embodiment, among others, a method for metal-assisted chemical etching includes providing a substrate; depositing a non-spherical metal catalyst on a surface of the substrate; etching the substrate by exposing the non-spherical metal catalyst and the substrate to an etchant solution including a composition of a fluoride etchant and an oxidizing agent; and removing the etched substrate from the etchant solution.
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