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Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
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机译:用于检测等离子体处理室中的撞击步骤的电容耦合静电(cce)探针装置及其方法
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摘要
A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists.
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