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Controlling agglomerated point defect and oxygen cluster formation induced by the lateral surface of a silicon single crystal during CZ growth
Controlling agglomerated point defect and oxygen cluster formation induced by the lateral surface of a silicon single crystal during CZ growth
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机译:控制CZ生长过程中单晶硅侧面引起的团聚点缺陷和氧簇形成
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摘要
Processes for preparing a single crystal silicon ingot are disclosed. In certain embodiments, the processes involve controlling (1) a growth velocity, v, of the ingot as well as (2) an average axial temperature gradient, G, a corrected average axial temperature gradient, Gcorrected, or an effective average axial temperature gradient, Geffective, during the growth of at least a segment of the constant diameter portion of the ingot.
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