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Dense homogeneous fluoride films for DUV elements and method of preparing same

机译:用于duv元件的致密均匀氟化物膜及其制备方法

摘要

The invention is directed to optical elements that are coated with dense homogeneous fluoride films and to a method of making such coated elements. The coatings materials are a high (“H”) refractive index fluoride material and a low (“L”) refractive index material that are co-evaporated to form a coating layer of a L-H coating material (a co-deposited coating of L and H materials). Lanthanide metal fluorides (for example, neodymium, lanthanum, dysprosium, yttrium and gadolinium, and combinations thereof) are preferred metal fluorides for use as the high refractive index materials with lanthanum fluoride (LaF3) and gadolinium fluoride (GdF3) being particularly preferred. Aluminum fluoride (AlF3) and alkaline earth metal fluorides (fluorides of calcium, magnesium, barium and strontium) are the preferred low refractive index materials, with magnesium fluoride (MgF2) being a preferred alkaline earth metal fluoride.
机译:本发明涉及涂覆有致密的均匀氟化物膜的光学元件以及制备这种涂覆的元件的方法。涂层材料是高(“ H”)折射率氟化物材料和低(“ L”)折射率材料,它们共同蒸发形成LH涂层的涂层(L和H材料)。镧系金属氟化物(例如钕,镧,,钇和g及其组合)是优选的金属氟化物,可与氟化镧(LaF 3 )和氟化g一起用作高折射率材料(GdF 3 )是特别优选的。氟化铝(AlF 3 )和碱土金属氟化物(钙,镁,钡和锶的氟化物)是首选的低折射率材料,氟化镁(MgF 2 )是优选的碱土金属氟化物。

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