首页> 外国专利> Insulated gate bipolar transistor (IGBT) with monolithic deep body clamp diode to prevent latch-up

Insulated gate bipolar transistor (IGBT) with monolithic deep body clamp diode to prevent latch-up

机译:带单片深体钳位二极管的绝缘栅双极晶体管(IGBT)可防止闩锁

摘要

A trench insulation gate bipolar transistor (IGBT) power device with a monolithic deep body clamp diode comprising a plurality of trench gates surrounded by emitter regions of a first conductivity type near a top surface of a semiconductor substrate of the first conductivity type encompassed in base regions of a second conductivity type. A collector region of the second conductivity type is disposed on a rear side opposite from the top surface of the semiconductor substrate corresponding to and underneath the trench gates surrounded by the emitter regions encompassed in the base regions constituting a plurality of insulation gate bipolar transistors (IGBTs). A deep dopant region of the second conductivity type having P-N junction depth deeper than the base region is disposed between and extending below the trench gates in the base region of the first conductivity type.
机译:一种具有整体式深体钳位二极管的沟槽绝缘栅双极晶体管(IGBT)功率器件,包括多个沟槽栅,该沟槽栅被第一导电类型的发射极区域围绕在基极区域中的第一导电类型的半导体衬底的顶面附近第二导电类型。第二导电类型的集电极区域设置在与半导体衬底的上表面相对的后侧上,该后表面对应于沟槽栅并在其下方,该沟槽栅被包围在构成多个绝缘栅双极晶体管(IGBT)的基极区中的发射极区包围)。具有比基极区域深的P-N结深度的第二导电类型的深掺杂剂区域设置在第一导电类型的基极区域中的沟槽栅极之间并在其下方延伸。

著录项

  • 公开/公告号US8058670B2

    专利类型

  • 公开/公告日2011-11-15

    原文格式PDF

  • 申请/专利权人 FWU-IUAN HSHIEH;

    申请/专利号US20090455744

  • 发明设计人 FWU-IUAN HSHIEH;

    申请日2009-06-04

  • 分类号H01L29/739;

  • 国家 US

  • 入库时间 2022-08-21 17:26:54

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