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Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements
Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements
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机译：被配置为补偿由于光学元件的加热而导致的投影特征的临界尺寸变化的光刻设备
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摘要
A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
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