u00f4composto sensitive to infrared radiation, its use and process of preparation, composition comprising the same, use of same, substrate coated with the same and coating process of substratosu00f6.

摘要

"Compound sensitive to infrared radiation, its use and process of preparation, composition comprising the same, use of the same.The substrate is coated by the same, and coating process of substrates.The present invention relates to a compound sensitive to infrared radiation and the new compositions for coating, using said compounds.In these compositions are suitable for coating substrates, especially aluminum lithographic printing plates or polyester, in films for color proof and photo resists.A composition for coating, which is primarily sensitive to energy in the infrared region, is formed by two layers.And the first layer contains a compound resulting from the reaction of a phenolic resin derived from bisphenol A and a dye absorber of infrared radiation, and the second layer contains a u00edmero or more of a polymer which adheres to the mixture of polymers of the first layer rendering it insoluble in a developer for positive conventional plates.That insolubiliza phenolic polymer of the first layer.