首页> 外国专利> AN ELECTROCHEMICAL PROCESS OF MAKING THIN FILM OR FOIL OF METAL USING A LOW CURRENT DENSITY TECHNIQUE

AN ELECTROCHEMICAL PROCESS OF MAKING THIN FILM OR FOIL OF METAL USING A LOW CURRENT DENSITY TECHNIQUE

机译:利用低电流密度技术制作金属薄膜或箔的电化学过程

摘要

The present invention relates to an electrochemical process of making thin film or foil of metal using a low current density technique, comprising the steps of preparing a specimen of a thin foil or a film; providing a twizzer having a conductive end for passing current and enabled to act as an anode; allowing the specimen to be gripped by the twizzer; providing an electrolyte bath filled with electrolyte corresponding to the type of foil or film being produced; disposing a mild steel sheet in the electrolyte bath which acts as a cathode; passing a current between the cathode and anode each being formed of dissimilar metals and alloys in the electrolyte, wherein the current density in the circuit is maintained low at the initial phase through restricting the voltage at a lower value which allows low local current density at first stage followed by setting of uniform current density, the specimen being periodically checked in an optical microscope followed by examination of the specimen when becomes transparent in a transmission electron microscope (TEM) to ensure development of the desired properties in the produced thin film or foil.
机译:本发明涉及一种用低电流密度技术制造金属薄膜或箔的电化学方法,包括制备薄箔或膜的样品的步骤。提供一种具有导电端以使电流通过并能够用作阳极的镊子;允许样品被镊子夹住;提供填充有与所生产的箔或膜的类型相对应的电解质的电解质浴;在作为阴极的电解液浴中放置软钢板。使电流在阴极和阳极之间通过,电流分别由电解质中的不同金属和合金形成,其中电路中的电流密度在初始阶段通过将电压限制在较低的值而保持较低,这首先允许较低的局部电流密度阶段,随后设置均匀的电流密度,定期在光学显微镜中检查样品,然后在透射电子显微镜(TEM)中变得透明时检查样品,以确保所生产的薄膜或箔片具有所需的性能。

著录项

  • 公开/公告号IN2010KO01253A

    专利类型

  • 公开/公告日2012-10-19

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN1253/KOL/2010

  • 发明设计人 TAPAS CHANDRA;

    申请日2010-11-08

  • 分类号C25D5/00;

  • 国家 IN

  • 入库时间 2022-08-21 17:24:20

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