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Method for recording optical diffraction gratings in the nanodimensional metal - chalcogenide glass - conductor structure

机译:在纳米金属-硫化物玻璃-导体结构中记录光学衍射光栅的方法。

摘要

The invention relates to the semiconductor photography and holography, in particular to methods for the formation of periodic structures in nanodimensional layers that are used in optoelectronics and microelectronics.The method for recording optical diffraction gratings in the nanodimensional metal - chalcogenide glass - conductor structure includes the exposure of structure to coherent radiation from the chalcogenide glass absorption region, in which as a nanodimensional structure is used the Al - As2Se3 - conductor structure, in which the thickness of chalcogenide glass As2Se3 does not exceed 500 nm, and the thickness of the aluminum layer does not exceed 50 nm, at the same time during exposure to it is applied an electric field with the intensity of 104…106 V/cm.The result of the invention is to increase the resistance to light action before and after exposure.
机译:本发明涉及半导体照相和全息术,尤其涉及在光电子学和微电子学中使用的纳米级层中形成周期性结构的方法。在纳米级金属-硫属化物玻璃-导体结构中记录光学衍射光栅的方法包括:将结构暴露于硫属化物玻璃吸收区的相干辐射中,其中使用Al-As2Se3-导体结构作为纳米尺度结构,其中硫属化物玻璃As2Se3的厚度不超过500 nm,铝层的厚度在不超过50nm的情况下,在曝光期间同时施加104…106V / cm 2的强度的电场。本发明的结果是增加了曝光前后的抗光作用性。

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