首页> 外国专利> VARIABLE RESISTANCE NON-VOLATILE STORAGE ELEMENT, VARIABLE RESISTANCE NON-VOLATILE STORAGE DEVICE, AND MANUFACTURING METHOD FOR VARIABLE RESISTANCE NON-VOLATILE STORAGE ELEMENT

VARIABLE RESISTANCE NON-VOLATILE STORAGE ELEMENT, VARIABLE RESISTANCE NON-VOLATILE STORAGE DEVICE, AND MANUFACTURING METHOD FOR VARIABLE RESISTANCE NON-VOLATILE STORAGE ELEMENT

机译:可变电阻非易失性存储元件,可变电阻非易失性存储装置以及可变电阻非易失性存储元件的制造方法

摘要

A variable resistance non-volatile storage element (10) is formed by layering a first electrode (101) formed from a material having a metal as the main component, a variable resistance layer (102) having a reversibly changeable resistance value depending on the application of predetermined electrical pulses having different polarities, a semiconductor layer (103) formed from a material having a nitrogen-deficient silicon nitride as the main component, and a second electrode (104). The variable resistance layer (102) is formed from a layered body of a first variable resistance layer (102a) and a second variable resistance layer (102b), the first variable resistance layer (102a) being adjacent to the first electrode (101), and the first variable resistance layer (102a) and the second variable resistance layer (102b) being formed from a material having an oxygen-deficient transition metal oxide as the main component. The oxygen content ratio of the first variable resistance layer (102a) is higher than the oxygen content ratio of the second variable resistance layer (102b). The layered body formed from the variable resistance layer (102), the semiconductor layer (103), and the second electrode (104) functions as a bidirectional diode element (106).
机译:电阻变化型非易失性存储元件(10)是通过层叠由以金属为主要成分的材料形成的第一电极(101)而形成的,电阻变化层(102)根据用途而具有可逆变化的电阻值。具有不同极性的预定电脉冲,由以氮不足的氮化硅为主要成分的材料形成的半导体层(103)和第二电极(104)。可变电阻层(102)由第一可变电阻层(102a)和第二可变电阻层(102b)的层状体形成,第一可变电阻层(102a)与第一电极(101)相邻,第一电阻变化层(102a)和第二电阻变化层(102b)由以氧不足的过渡金属氧化物为主要成分的材料形成。第一电阻变化层(102a)的氧含量比第二电阻变化层(102b)的氧含量高。由电阻变化层(102),半导体层(103)和第二电极(104)形成的层状体用作双向二极管元件(106)。

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